Dr. Eugene Barash
Ph.D.
Niskayuna, NY 12309
Office: 518-373-4165
Introduction
Consultant, advisor to Semiconductor, Photonics, MEMs, Life Sciences in Product and Technology development, P&L Management, Semiconductor Fab Operations. Successful expert witness on semiconductors technology cases.
Experienced Engineer and Manager with proven track records in Semiconductor Industry. Expert knowledge in semiconductors R&D, High-Volume Manufacturing and business operations. Diverse experience in High-tech R&D, High-Volume Manufacturing (HVM), and start-up environments. Subject expert with published papers in number of peer-reviewed technical publications.
Areas of Expertise
- Contract Manufacturing
- Electronics
- Intellectual Property
- Microelectronics
- Patents
- Risk Management
- Semiconductors
- Statistics
- Supply Chain
- Technology
Expert Background
- Q: Please list your professional accreditations, degrees, licenses, and certificates granted:
- A: • Master Certificate in Project Management, The George Washington University, School of Business, Washington DC
• PhD, Solid State Technology, A.F. Ioffe's Physico-Technical Institute of Russian Academy of Science, St. Petersburg, Russia. Dissertation work “Excimer Laser application in 248 / 193nm lithography”
• M.S., Physics, Institute of Precision Mechanics and Optics, St. Petersburg, Russia. Major in Opto and Quantum Electronics, diploma with honors
• Six Sigma Black Belt Certificate, Motorola University, Tempe, AZ
- Q: Please list your affiliations or memberships in any professional and/or industry organizations:
- A: IEEE member
- Q: For what area(s) of expertise have you been retained as an expert?
- A: Semiconductor chips design and manufacturing; process and design know-how; IP infringement.
- Q: In what percentage of your cases were you retained by the defendant?
- A: 100%
Publications/Articles
- Practical Limits of Excimer Laser Lithography, Laser Optics Conference Presentation, 2014
- US8,956,885B2: Method and Process to Reduce Stress Based Overlay Error
- US 10,241,502B2: Methods of error detection in fabrication processes
- WO2008136734: METHODS AND SYSTEMS FOR DETECTING BIOLOGICAL AND CHEMICAL MATERIALS ON A SUBMICRON STRUCTURED SUBSTRATE
- WO2009073306: CHEMICAL AND BIOLOGICAL DETECTION METHOD AND DEVICE BASED ON MEASUREMENTS OF FLUORESCENCE AND REFLECTIVITY
- Broadband Microlithography: Process Development using PROLITH model: SPIE Conference
- DUV Patterning using inorganic resist films
References
Available Upon Request